12 May 2005
GE’s New Anti-Static, Impact-Resistant LNP* Stat-Loy* Compounds Help Enhance Security for Plasmon UDO™ Optical Media
BERGEN OP ZOOM, THE NETHERLANDS — May 12, 2005 — Plasmon, a market leader for professional data archival solutions, designed its cutting-edge UDO™ (Ultra Density Optical) media to be a highly secure archival storage medium for its customers’ valuable electronic data. Part of that security solution stems from Plasmon’s use of new D Series LNP* Stat-Loy* resins from GE Advanced Materials. Used to form the shell of Plasmon’s SLMD2005 UDO media, the Lexan* resin-based LNP compounds contribute an excellent balance of impact performance and resistance to static build-up.
Plasmon’s UDO media signifies a leap forward in optical storage. Its 5.25-in. UDO technology breaks the mold for optical storage solutions, by increasing storage capacity and dramatically lowering archival storage costs. Plasmon’s selection of GE’s impact-resistant, anti-static compounds lends UDO media an added degree of security for the important data they store.
"GE Advanced Materials and, more specifically, the performance of its new LNP brand of anti-static polycarbonate (PC) compounds contributed notably to our successful development of an extremely cost-competitive and reliable, optical storage media," said Nigel Street, chief executive, Plasmon. “We are very pleased with the results.”
Like GE’s other LNP Stat-Loy compounds, the new D Series provides excellent surface resistivity performance between 1011 and 1012 ohms/sq. This quality helps reduce accumulated static charge that can cause dust to collect or plastic parts to discharge static electricity. The compounds are, therefore, an excellent consideration for applications such as high-density media, internal hard disk parts, and air duct housings.
The new Lexan polycarbonate-based D Series products are formulated using halogen-free flame-retardant technology and offer an excellent balance of mechanical properties including impact resistance, tensile strength, and flexural modulus.
“This new series of polycarbonate-based compounds both expands and enhances GE’s LNP Stat-Loy product line by offering the option of enhanced impact resistance with the excellent anti-static performance typical of traditional LNP Stat-Loy compounds,” said Tsutomu Kinoshita, Asia/Pacific product manager for Stat-Loy products, GE Advanced Materials.
Reader enquiries
GE PlasticsPlasticslaan 1
4600 AC Bergen op Zoom
Netherlands
Helen Vandebovenkamp
helen.vandebovenkamp@ge.com
Tel: +31 164 29 20 97
Fax: +31 164 29 10 66
Netherlands
Notes for editors
About GE Advanced Materials
GE Advanced Materials (www.geadvancedmaterials.com) is a world leader in providing high-technology material solutions. Headquartered in Pittsfield, Mass., its businesses include Plastics, Silicones, Quartz, Automotive, Specialty Film & Sheet, Polymershapes, and Sealants and Adhesives.
GE (NYSE: GE) is Imagination at Work – a diversified technology, media and financial services company focused on solving some of the world's toughest problems. With products and services ranging from aircraft engines, power generation, water processing and security technology to medical imaging, business and consumer financing, media content and advanced materials, GE serves customers in more than 100 countries and employs more than 300,000 people worldwide. For more information, visit the company's Web site at www.ge.com.
* LNP, Stat-Loy, and Lexan are trademarks of General Electric Company.
™ Plasmon, UDO, and Raidtec are registered trademarks of Plasmon Plc.
Related images
GE’s LNP* Stat-Loy* D Series Compounds Form the Shells of Plasmon’s UDO™ Media
Plasmon, a market leader for professional data archival solutions, designed its cutting-edge UDO™ (Ultra Density Optical) media to be a highly secure archival storage medium for its customers’ valuable electronic data. Part of that security arises from Plasmon’s use of new D Series LNP* Stat-Loy* resins from GE Advanced Materials. Used to form the shell of Plasmon’s SLMD2005 UDO media, the Lexan* resin-based LNP compounds contribute an excellent balance of impact performance and resistance to static charge build-up. The new GE compounds are also good potential candidates for applications such as high-density media, internal hard disk parts, and air duct housings.
Editorial enquiries
Helen Vandebovenkamp
GE Plastics
Folke Markestein
Marketing Solutions NV
fmarkestein@marketingsolutions.be
Jim Allison
AH&M Marketing Communications